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Processing and
Characterisation
A full range of electrical and optical spectroscopy characterisation
techniques are available:
- Temperature dependent CV, IV DLTS and Hall effect.
Carrier profiling from Hall or CV.
- Automatic four point probe, ellipsometry and
thermal wave systems for wafer mapping.
- Optical characterisation including photoluminescence,
photoreflectance etc.
A range of Processing Equipment and Techniques
are also available:
- Comprehensive furnace and RTA systems.
- Comprehensive metal and dielectric deposition
systems.
- Photolithography to 1.5 microns.
Processes available include:
- Electrical Isolation (up to 10 microns in III-Vs,
for example).
- Carrier lifetime modifications in silicon.
- Ultra shallow doping.
- Ion Beam Synthesis of oxides, nitrides, carbides,
SiGe etc.
- Corrosion and wear modification in metals.
- Fabrication of waveguides by refractive index
modification.
- Semiconductor encapsulation and annealing.
- Fabrication of test structures for feasibility
studies.
Doping and synthesis of amorphous alloys for flat
panel displays.
Last updated 20th November 2001
K.Arthur@surrey.ac.uk
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